Center for Relativistic Laser Science

To mechanically exfoliate or synthesize 2D materials using CVD chamber in order to fabricate the related devices inside glove boxes.

O2 content : Less than 1 ppm
H2O content : Less than 1 ppm
Atmospheric gas : Ar (5N), kept as ~2 atm
Ante chamber pressure : ~mtorr by rotary oil pump
Pattern generator - Laser wevalength: 435 nm on normal PR (GXR 601, PR 4330), minimum pattern size ~ 1 um