IBS Institute for Basic Science
Search

공지사항

Ebeam lithography

equipment explanation
Model Customized
Operating time SUN(00:00~24:00)
MON(00:00~24:00)
TUE(00:00~24:00)
WED(00:00~24:00)
THU(00:00~24:00)
FRI(00:00~24:00)
SAT(00:00~24:00)
Location 86698
inquiry Tuan Dung
010-9486-2804
dungnt@skku.edu
Reservation

Notice

 

Only assigned operators can use this machine 3 hour use will be maximum

 

Available Time // 09:00~24:00 on every day.

 

Current status // Now on operation

E-beam lithography system is used to pattern micro/sub-micro structure

 

 

Magnification: X5-300,000 / resolution: 3.0nm
Specimen Size: Up to 150mm(diameter) / Accelerating Voltage: 0.5-30kV
Electron Gun: W Hairpin Filament / User interface: PC/AT Compatible/Windows Vista
Observation Monitor: 19" LCD Monitor / Ethernet: Connectable
Analytical Functions: EDS,WDS / Evacuation Sys: TMP+RP